The stock of Natcore Technology Inc (CVE:NXT) gapped up by $0.015 today and has $0.53 target or 75.00% above today’s $0.31 share price. The 6 months technical chart setup indicates low risk for the $19.61 million company. The gap was reported on Oct, 28 by Barchart.com. If the $0.53 price target is reached, the company will be worth $14.71 million more.
Gaps up are useful for using as a support level and to some extent as a tradeable event. If investors already hold the stock and experience a price gap up, then its usually a good idea to hold the stock for a stronger up move. Back-tests of these patterns indicate that two-thirds of the times the stock performance improves after the gap. The area gaps close 89% of the time, the breakaway gaps, 2%, the continuation gaps 4% and the exhaustion gaps 61%. About 59,800 shares traded hands. Natcore Technology Inc (CVE:NXT) has risen 6.00% since September 28, 2016 and is uptrending. It has outperformed by 1.29% the S&P500.
More notable recent Natcore Technology Inc (CVE:NXT) news were published by: Investingnews.com which released: “Natcore Technology” on November 13, 2015, also Prnewswire.com with their article: “Natcore Technology to Serve as Technical Advisor For 1000 MW Solar Facility in …” published on October 25, 2016, Prnewswire.com published: “Natcore Technology Develops Breakthrough Solar Cell Structure” on July 09, 2015. More interesting news about Natcore Technology Inc (CVE:NXT) were released by: Seekingalpha.com and their article: “Natcore Controls The Most Important Solar Technology Today” published on October 18, 2013 as well as Prnewswire.com‘s news article titled: “Natcore Technology Develops Solar Cell That Eliminates Use of Silver” with publication date: August 18, 2015.
Natcore Technology, Inc. is a research and development firm focusing on solar cells. The company has a market cap of $19.61 million. The Company’s primary technology is laser-processed back-contact cells. It currently has negative earnings. Natcore offers a liquid phase deposition (LPD) technology, which enables the controlled deposition of silicon dioxide and mixed silicon oxides from an aqueous solution at ambient temperatures and pressures.
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